Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
The effect of iridium precursor on oxide-supported iridium catalysts prepared by atomic layer deposition
The effect of iridium precursor on oxide-supported iridium catalysts prepared by atomic layer deposition
The effect of iridium precursor on oxide-supported iridium catalysts prepared by atomic layer deposition
Vuori, H. (Autor:in) / Pasanen, A. (Autor:in) / Lindblad, M. (Autor:in) / Valden, M. (Autor:in) / Niemela, M. V. (Autor:in) / Krause, A. O. (Autor:in)
APPLIED SURFACE SCIENCE ; 257 ; 4204-4210
01.01.2011
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
New MOCVD precursor for iridium thin films deposition
British Library Online Contents | 2007
|British Library Online Contents | 2007
|A New Precursor for Metal Organic Chemical Vapor Deposition of Iridium Thin Films
British Library Online Contents | 2006
|British Library Online Contents | 2004
|British Library Online Contents | 1993
|