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Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection
Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection
Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection
de Rooij-Lohmann, V. I. (Autor:in) / Yakshin, A. E. (Autor:in) / Zoethout, E. (Autor:in) / Verhoeven, J. (Autor:in) / Bijkerk, F. (Autor:in)
APPLIED SURFACE SCIENCE ; 257 ; 6251-6255
01.01.2011
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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