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Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection
Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection
Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection
de Rooij-Lohmann, V. I. (author) / Yakshin, A. E. (author) / Zoethout, E. (author) / Verhoeven, J. (author) / Bijkerk, F. (author)
APPLIED SURFACE SCIENCE ; 257 ; 6251-6255
2011-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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