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Controlling precursor stability and evaporation through molecular design. Pseudo single source precursor approach to MOCVD SrTiO3 thin films
Controlling precursor stability and evaporation through molecular design. Pseudo single source precursor approach to MOCVD SrTiO3 thin films
Controlling precursor stability and evaporation through molecular design. Pseudo single source precursor approach to MOCVD SrTiO3 thin films
Seisenbaeva, G. A. (Autor:in) / Gohil, S. (Autor:in) / Kessler, V. G. (Autor:in) / Andrieux, M. (Autor:in) / Legros, C. (Autor:in) / Ribot, P. (Autor:in) / Brunet, M. (Autor:in) / Scheid, E. (Autor:in)
APPLIED SURFACE SCIENCE ; 257 ; 2281-2290
01.01.2011
10 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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