Correlation between the growth-per-cycle and the surface hydroxyl group concentration in the atomic layer deposition of aluminum oxide from trimethylaluminum and water

Puurunen, R. L. | British Library Online Contents | 2005

The Use of Trimethylaluminum for Producing Surface Layers by the PACVD Method

Sobiecki, J. R. / Sitek, R. / Wierzchon, T. | British Library Online Contents | 2005

Determination of Metal Impurities in Trimethylaluminum by Spectrochemical Analysis

Rezchikov, V. G. / Murzina, O. I. | British Library Online Contents | 1995

Initial reaction of silicon precursors with a varying number of dimethylamino ligands on a hydroxyl-terminated silicon (001) surface

Jeong, Y. C. / Baek, S. B. / Kim, D. H. et al. | British Library Online Contents | 2013

Initial reaction of silicon precursors with a varying number of dimethylamino ligands on a hydroxyl-terminated silicon (001) surface

Jeong, Y. C. / Baek, S. B. / Kim, D. H. et al. | British Library Online Contents | 2013