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Correlation between the growth-per-cycle and the surface hydroxyl group concentration in the atomic layer deposition of aluminum oxide from trimethylaluminum and water
Correlation between the growth-per-cycle and the surface hydroxyl group concentration in the atomic layer deposition of aluminum oxide from trimethylaluminum and water
Correlation between the growth-per-cycle and the surface hydroxyl group concentration in the atomic layer deposition of aluminum oxide from trimethylaluminum and water
Puurunen, R. L. (Autor:in)
APPLIED SURFACE SCIENCE ; 245 ; 6-10
01.01.2005
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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