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Properties of nanocrystalline Al-Cu-O films reactively sputtered by DC pulse dual magnetron
Properties of nanocrystalline Al-Cu-O films reactively sputtered by DC pulse dual magnetron
Properties of nanocrystalline Al-Cu-O films reactively sputtered by DC pulse dual magnetron
Blazek, J. (Autor:in) / Musil, J. (Autor:in) / Stupka, P. (Autor:in) / Cerstvy, R. (Autor:in) / Houska, J. (Autor:in)
APPLIED SURFACE SCIENCE ; 258 ; 1762-1767
01.01.2011
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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