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Recent progress in ab initio simulations of hafnia-based gate stacks
Recent progress in ab initio simulations of hafnia-based gate stacks
Recent progress in ab initio simulations of hafnia-based gate stacks
Zhu, H. (Autor:in) / Tang, C. (Autor:in) / Fonseca, L. R. (Autor:in) / Ramprasad, R. (Autor:in)
JOURNAL OF MATERIALS SCIENCE ; 47 ; 7399-7416
01.01.2012
18 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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