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UV assisted oxidation and nitridation of hafnia based thin films for alternate gate dielectric applications
UV assisted oxidation and nitridation of hafnia based thin films for alternate gate dielectric applications
UV assisted oxidation and nitridation of hafnia based thin films for alternate gate dielectric applications
Ramani, K. (Autor:in) / Essary, C. R. (Autor:in) / Craciun, V. (Autor:in) / Singh, R. K. (Autor:in)
APPLIED SURFACE SCIENCE ; 253 ; 6493-6498
01.01.2007
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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