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Studies on the effect of hydrogen doping during deposition of Al:ZnO films using RF magnetron sputtering
Studies on the effect of hydrogen doping during deposition of Al:ZnO films using RF magnetron sputtering
Studies on the effect of hydrogen doping during deposition of Al:ZnO films using RF magnetron sputtering
Shantheyanda, B. P. (Autor:in) / Sundaram, K. B. (Autor:in) / Shiradkar, N. S. (Autor:in)
01.01.2012
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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