Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Challenges and opportunities in advanced Ge pMOSFETs
Challenges and opportunities in advanced Ge pMOSFETs
Challenges and opportunities in advanced Ge pMOSFETs
Simoen, E. (Autor:in) / Mitard, J. (Autor:in) / Hellings, G. (Autor:in) / Eneman, G. (Autor:in) / De Jaeger, B. (Autor:in) / Witters, L. (Autor:in) / Vincent, B. (Autor:in) / Loo, R. (Autor:in) / Delabie, A. (Autor:in) / Sioncke, S. (Autor:in)
01.01.2012
13 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Short channel effect improved strained-Si:C-source/drain PMOSFETs
British Library Online Contents | 2008
|Mobility and performance enhancement in compressively strained SiGe channel PMOSFETs
British Library Online Contents | 2004
|Improvement of the short channel effect in PMOSFETs using cold implantation
British Library Online Contents | 2016
|British Library Online Contents | 2012
|