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Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process
Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process
Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process
Tadaszak, K. (Autor:in) / Nitsch, K. (Autor:in) / Piasecki, T. (Autor:in) / Posadowski, W. M. (Autor:in)
MATERIALS SCIENCE -WROCLAW- ; 30 ; 323-328
01.01.2012
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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