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Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process

Tadaszak, K. / Nitsch, K. / Piasecki, T. / Posadowski, W. M.

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Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process

Tadaszak, K. / Nitsch, K. / Piasecki, T. / Posadowski, W. M.

Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process

Tadaszak, K. / Nitsch, K. / Piasecki, T. / Posadowski, W. M.

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Check availability in my library

Order at Subito €

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Document information

Title:

Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process

Contributors:

Tadaszak, K. (author) / Nitsch, K. (author) / Piasecki, T. (author) / Posadowski, W. M. (author)

Published in:

MATERIALS SCIENCE -WROCLAW- ; 30 ; 323-328

Publication date:

2012-01-01

Size:

6 pages

ISSN:

0137-1339

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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