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Effect of NH~3 Post-Oxidation Annealing on Flatness of SiO~2/SiC Interface
Effect of NH~3 Post-Oxidation Annealing on Flatness of SiO~2/SiC Interface
Effect of NH~3 Post-Oxidation Annealing on Flatness of SiO~2/SiC Interface
Soejima, N. (Autor:in) / Kimura, T. (Autor:in) / Ishikawa, T. (Autor:in) / Sugiyama, T. (Autor:in) / Lebedev, A.A. / Davydov, S.Y. / Ivanov, P.A. / Levinshtein, M.E.
01.01.2013
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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