Influence of Exposure at 750^oC on Room Temperature Tensile Ductility of Cast TiAl Alloy with the Directional Lamellar Microstructure: Fid-Bau Portal

Influence of Exposure at 750^oC on Room Temperature Tensile Ductility of Cast TiAl Alloy with the Directional Lamellar Microstructure

Zhu, C.L. / Zhang, X.W. / Zhang, J.

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Influence of Exposure at 750^oC on Room Temperature Tensile Ductility of Cast TiAl Alloy with the Directional Lamellar Microstructure

Zhu, C.L. / Zhang, X.W. / Zhang, J.

Influence of Exposure at 750^oC on Room Temperature Tensile Ductility of Cast TiAl Alloy with the Directional Lamellar Microstructure

Zhu, C.L. / Zhang, X.W. / Zhang, J.

Zugriff

Zugriff über TIB

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Bestellung bei Subito €

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Dokumentinformationen

Ähnliche Titel

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Titel:

Influence of Exposure at 750^oC on Room Temperature Tensile Ductility of Cast TiAl Alloy with the Directional Lamellar Microstructure

Beteiligte:

Zhu, C.L. (Autor:in) / Zhang, X.W. (Autor:in) / Zhang, J. (Autor:in) / Han, Y. / Lin, J. / Xiao, C. / Zeng, X.

Erschienen in:

High Performance Structure Materials ; 115-123

MATERIALS SCIENCE FORUM ; 747/748

Erscheinungsdatum:

01.01.2013

Format / Umfang:

9 pages

ISSN:

0255-5476

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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