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    Influence of Exposure at 750^oC on Room Temperature Tensile Ductility of Cast TiAl Alloy with the Directional Lamellar Microstructure

    New search for: Zhu, C.L.
    New search for: Zhang, X.W.
    New search for: Zhang, J.
    New search for: Han, Y.
    New search for: Lin, J.
    New search for: Xiao, C.
    New search for: Zeng, X.

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    Influence of Exposure at 750^oC on Room Temperature Tensile Ductility of Cast TiAl Alloy with the Directional Lamellar Microstructure

    New search for: Zhu, C.L.
    New search for: Zhang, X.W.
    New search for: Zhang, J.
    New search for: Han, Y.
    New search for: Lin, J.
    New search for: Xiao, C.
    New search for: Zeng, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Influence of Exposure at 750^oC on Room Temperature Tensile Ductility of Cast TiAl Alloy with the Directional Lamellar Microstructure

    New search for: Zhu, C.L.
    New search for: Zhang, X.W.
    New search for: Zhang, J.
    New search for: Han, Y.
    New search for: Lin, J.
    New search for: Xiao, C.
    New search for: Zeng, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Influence of Exposure at 750^oC on Room Temperature Tensile Ductility of Cast TiAl Alloy with the Directional Lamellar Microstructure

    Contributors:

    Zhu, C.L. (author) / Zhang, X.W. (author) / Zhang, J. (author) / Han, Y. / Lin, J. / Xiao, C. / Zeng, X.

    Published in:

    High Performance Structure Materials ; 115-123

    MATERIALS SCIENCE FORUM ; 747/748

    Publication date:

    2013-01-01

    Size:

    9 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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