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Ultralow Contact Resistance at an Epitaxial Metal/Oxide Heterojunction Through Interstitial Site Doping
Ultralow Contact Resistance at an Epitaxial Metal/Oxide Heterojunction Through Interstitial Site Doping
Ultralow Contact Resistance at an Epitaxial Metal/Oxide Heterojunction Through Interstitial Site Doping
Chambers, S. A. (Autor:in) / Gu, M. (Autor:in) / Sushko, P. V. (Autor:in) / Yang, H. (Autor:in) / Wang, C. (Autor:in) / Browning, N. D. (Autor:in)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 25 ; 4001-4005
01.01.2013
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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