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Controlling Oxygen Content by Varying Oxygen Partial Pressure in Chromium Oxynitride Thin Films Prepared by Pulsed Laser Deposition
Controlling Oxygen Content by Varying Oxygen Partial Pressure in Chromium Oxynitride Thin Films Prepared by Pulsed Laser Deposition
Controlling Oxygen Content by Varying Oxygen Partial Pressure in Chromium Oxynitride Thin Films Prepared by Pulsed Laser Deposition
Suzuki, K. (Autor:in) / Endo, T. (Autor:in) / Fukushima, T. (Autor:in) / Sato, A. (Autor:in) / Suzuki, T. (Autor:in) / Nakayama, T. (Autor:in) / Suematsu, H. (Autor:in) / Niihara, K. (Autor:in)
MATERIALS TRANSACTIONS ; 54 ; 1140-1144
01.01.2013
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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