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Controlling Oxygen Content by Varying Oxygen Partial Pressure in Chromium Oxynitride Thin Films Prepared by Pulsed Laser Deposition
Controlling Oxygen Content by Varying Oxygen Partial Pressure in Chromium Oxynitride Thin Films Prepared by Pulsed Laser Deposition
Controlling Oxygen Content by Varying Oxygen Partial Pressure in Chromium Oxynitride Thin Films Prepared by Pulsed Laser Deposition
Suzuki, K. (author) / Endo, T. (author) / Fukushima, T. (author) / Sato, A. (author) / Suzuki, T. (author) / Nakayama, T. (author) / Suematsu, H. (author) / Niihara, K. (author)
MATERIALS TRANSACTIONS ; 54 ; 1140-1144
2013-01-01
5 pages
Article (Journal)
English
DDC:
620.11
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