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Silicide formation during reaction between Ni ultra-thin films and Si(001) substrates
Silicide formation during reaction between Ni ultra-thin films and Si(001) substrates
Silicide formation during reaction between Ni ultra-thin films and Si(001) substrates
Fouet, J. (Autor:in) / Texier, M. (Autor:in) / Richard, M. I. (Autor:in) / Portavoce, A. (Autor:in) / Mangelinck, D. (Autor:in) / Guichet, C. (Autor:in) / Boudet, N. (Autor:in) / Thomas, O. (Autor:in)
MATERIALS LETTERS ; 116 ; 139-142
01.01.2014
4 pages
Aufsatz (Zeitschrift)
Englisch
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