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    Silicide formation during reaction between Ni ultra-thin films and Si(001) substrates

    New search for: Fouet, J.
    New search for: Texier, M.
    New search for: Richard, M. I.
    New search for: Portavoce, A.
    New search for: Mangelinck, D.
    New search for: Guichet, C.
    New search for: Boudet, N.
    New search for: Thomas, O.

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    Silicide formation during reaction between Ni ultra-thin films and Si(001) substrates

    New search for: Fouet, J.
    New search for: Texier, M.
    New search for: Richard, M. I.
    New search for: Portavoce, A.
    New search for: Mangelinck, D.
    New search for: Guichet, C.
    New search for: Boudet, N.
    New search for: Thomas, O.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Silicide formation during reaction between Ni ultra-thin films and Si(001) substrates

    New search for: Fouet, J.
    New search for: Texier, M.
    New search for: Richard, M. I.
    New search for: Portavoce, A.
    New search for: Mangelinck, D.
    New search for: Guichet, C.
    New search for: Boudet, N.
    New search for: Thomas, O.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Silicide formation during reaction between Ni ultra-thin films and Si(001) substrates

    Contributors:

    Fouet, J. (author) / Texier, M. (author) / Richard, M. I. (author) / Portavoce, A. (author) / Mangelinck, D. (author) / Guichet, C. (author) / Boudet, N. (author) / Thomas, O. (author)

    Published in:

    MATERIALS LETTERS ; 116 ; 139-142

    Publication date:

    2014-01-01

    Size:

    4 pages

    ISSN:

    0167-577X

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.1105 / 530

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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