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Reliability Improvement and Optimization of Trench Orientation of 4H-SiC Trench-Gate Oxide
Reliability Improvement and Optimization of Trench Orientation of 4H-SiC Trench-Gate Oxide
Reliability Improvement and Optimization of Trench Orientation of 4H-SiC Trench-Gate Oxide
Kojima, T. (Autor:in) / Harada, S. (Autor:in) / Ariyoshi, K. (Autor:in) / Senzaki, J. (Autor:in) / Takei, M. (Autor:in) / Yonezawa, Y. (Autor:in) / Tanaka, Y. (Autor:in) / Okumura, H. (Autor:in) / Okumura, H. / Harima, H.
01.01.2014
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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Effect of Damage Removal Treatment after Trench Etching on the Reliability of Trench MOSFET
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