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Study of material removal processes of the crystal silicon substrate covered by an oxide film under a silica cluster impact: Molecular dynamics simulation
Study of material removal processes of the crystal silicon substrate covered by an oxide film under a silica cluster impact: Molecular dynamics simulation
Study of material removal processes of the crystal silicon substrate covered by an oxide film under a silica cluster impact: Molecular dynamics simulation
APPLIED SURFACE SCIENCE ; 305 ; 609-616
01.01.2014
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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