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    Study of material removal processes of the crystal silicon substrate covered by an oxide film under a silica cluster impact: Molecular dynamics simulation

    New search for: Chen, R.
    New search for: Wu, Y.
    New search for: Lei, H.
    New search for: Jiang, R.
    New search for: Liang, M.

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    Study of material removal processes of the crystal silicon substrate covered by an oxide film under a silica cluster impact: Molecular dynamics simulation

    New search for: Chen, R.
    New search for: Wu, Y.
    New search for: Lei, H.
    New search for: Jiang, R.
    New search for: Liang, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Study of material removal processes of the crystal silicon substrate covered by an oxide film under a silica cluster impact: Molecular dynamics simulation

    New search for: Chen, R.
    New search for: Wu, Y.
    New search for: Lei, H.
    New search for: Jiang, R.
    New search for: Liang, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Study of material removal processes of the crystal silicon substrate covered by an oxide film under a silica cluster impact: Molecular dynamics simulation

    Contributors:

    Chen, R. (author) / Wu, Y. (author) / Lei, H. (author) / Jiang, R. (author) / Liang, M. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 305 ; 609-616

    Publication date:

    2014-01-01

    Size:

    8 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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