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Water wettability of Si(111) and (001) surfaces prepared to be reconstructed, atomic-hydrogen terminated and thinly oxidized in an ultrahigh vacuum chamber
Water wettability of Si(111) and (001) surfaces prepared to be reconstructed, atomic-hydrogen terminated and thinly oxidized in an ultrahigh vacuum chamber
Water wettability of Si(111) and (001) surfaces prepared to be reconstructed, atomic-hydrogen terminated and thinly oxidized in an ultrahigh vacuum chamber
Miyagi, T. (Autor:in) / Sasahara, A. (Autor:in) / Tomitori, M. (Autor:in)
APPLIED SURFACE SCIENCE ; 349 ; 904-910
01.01.2015
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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