Mechanisms of lamellar structure formation and Cr interfacial segregation in C11b-MoSi2/C40-NbSi2 dual phase silicide verified by a phase-field simulation incorporating elastic inhomogeneity

Yamazaki, T. / Koizumi, Y. / Yuge, K. et al. | British Library Online Contents | 2015

Pseudo-C11b Phase Formation of Titanium Disilicide During the C49 to C54 Transition

Smith, P. L. / Brennan, B. / Ortega, R. et al. | British Library Conference Proceedings | 1998

Electrodeposition of Mo/Re duplex layer and preparation of MoSi2/ReSi2/NbSi2 compound coating on Nb-Ti-Si based alloy

Yue, Gao / Guo, Xiping / Qiao, Yanqiang et al. | British Library Online Contents | 2019

Stacking faults on (001) and their influence on the deformation and fracture behavior of single crystals of MoSi2-WSi2 solid-solutions with the C11b structure

Inui, H. / Ito, K. / Nakamoto, T. et al. | British Library Online Contents | 2001

Phase Inhomogeneity and Electrical Characteristics of Nickel Silicide Schottky Contacts Formed on 4H-SiC

Nikitina, L.P. / Vassilevski, K.V. / Horsfall, A.B. et al. | British Library Online Contents | 2009