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Mechanisms of lamellar structure formation and Cr interfacial segregation in C11b-MoSi2/C40-NbSi2 dual phase silicide verified by a phase-field simulation incorporating elastic inhomogeneity
Mechanisms of lamellar structure formation and Cr interfacial segregation in C11b-MoSi2/C40-NbSi2 dual phase silicide verified by a phase-field simulation incorporating elastic inhomogeneity
Mechanisms of lamellar structure formation and Cr interfacial segregation in C11b-MoSi2/C40-NbSi2 dual phase silicide verified by a phase-field simulation incorporating elastic inhomogeneity
Yamazaki, T. (author) / Koizumi, Y. (author) / Yuge, K. (author) / Chiba, A. (author) / Hagihara, K. (author) / Nakano, T. (author) / Kishida, K. (author) / Inui, H. (author)
COMPUTATIONAL MATERIALS SCIENCE ; 108 ; 358-366
2015-01-01
9 pages
Article (Journal)
English
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