Atomic insight into tribochemical wear mechanism of silicon at the Si/SiO2 interface in aqueous environment: Molecular dynamics simulations using ReaxFF reactive force field: Fid-Bau Portal

Atomic insight into tribochemical wear mechanism of silicon at the Si/SiO2 interface in aqueous environment: Molecular dynamics simulations using ReaxFF reactive force field

Wen, J. / Ma, T. / Zhang, W. / Psofogiannakis, G. / van Duin, A. C. / Chen, L. / Qian, L. / Hu, Y. / Lu, X.

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Atomic insight into tribochemical wear mechanism of silicon at the Si/SiO2 interface in aqueous environment: Molecular dynamics simulations using ReaxFF reactive force field

Wen, J. / Ma, T. / Zhang, W. / Psofogiannakis, G. / van Duin, A. C. / Chen, L. / Qian, L. / Hu, Y. / Lu, X.

Atomic insight into tribochemical wear mechanism of silicon at the Si/SiO2 interface in aqueous environment: Molecular dynamics simulations using ReaxFF reactive force field

Wen, J. / Ma, T. / Zhang, W. / Psofogiannakis, G. / van Duin, A. C. / Chen, L. / Qian, L. / Hu, Y. / Lu, X.

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Titel:

Atomic insight into tribochemical wear mechanism of silicon at the Si/SiO2 interface in aqueous environment: Molecular dynamics simulations using ReaxFF reactive force field

Beteiligte:

Wen, J. (Autor:in) / Ma, T. (Autor:in) / Zhang, W. (Autor:in) / Psofogiannakis, G. (Autor:in) / van Duin, A. C. (Autor:in) / Chen, L. (Autor:in) / Qian, L. (Autor:in) / Hu, Y. (Autor:in) / Lu, X. (Autor:in)

Erschienen in:

APPLIED SURFACE SCIENCE ; 390 ; 216-223

Erscheinungsdatum:

01.01.2016

Format / Umfang:

8 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.35

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