Atomic insight into tribochemical wear mechanism of silicon at the Si/SiO2 interface in aqueous environment: Molecular dynamics simulations using ReaxFF reactive force field: Fid-Bau Portal

Atomic insight into tribochemical wear mechanism of silicon at the Si/SiO2 interface in aqueous environment: Molecular dynamics simulations using ReaxFF reactive force field

Wen, J. / Ma, T. / Zhang, W. / Psofogiannakis, G. / van Duin, A. C. / Chen, L. / Qian, L. / Hu, Y. / Lu, X.

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Atomic insight into tribochemical wear mechanism of silicon at the Si/SiO2 interface in aqueous environment: Molecular dynamics simulations using ReaxFF reactive force field

Wen, J. / Ma, T. / Zhang, W. / Psofogiannakis, G. / van Duin, A. C. / Chen, L. / Qian, L. / Hu, Y. / Lu, X.

Atomic insight into tribochemical wear mechanism of silicon at the Si/SiO2 interface in aqueous environment: Molecular dynamics simulations using ReaxFF reactive force field

Wen, J. / Ma, T. / Zhang, W. / Psofogiannakis, G. / van Duin, A. C. / Chen, L. / Qian, L. / Hu, Y. / Lu, X.

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Check availability in my library

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Title:

Atomic insight into tribochemical wear mechanism of silicon at the Si/SiO2 interface in aqueous environment: Molecular dynamics simulations using ReaxFF reactive force field

Contributors:

Wen, J. (author) / Ma, T. (author) / Zhang, W. (author) / Psofogiannakis, G. (author) / van Duin, A. C. (author) / Chen, L. (author) / Qian, L. (author) / Hu, Y. (author) / Lu, X. (author)

Published in:

APPLIED SURFACE SCIENCE ; 390 ; 216-223

Publication date:

2016-01-01

Size:

8 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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