Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Scratch Behavior of ZrO2 Thin Film Prepared by Atomic Layer Deposition Method on Silicon Wafer
Scratch Behavior of ZrO2 Thin Film Prepared by Atomic Layer Deposition Method on Silicon Wafer
Scratch Behavior of ZrO2 Thin Film Prepared by Atomic Layer Deposition Method on Silicon Wafer
Kim, S. H. (Autor:in) / Yang, B. C. (Autor:in) / An, J. (Autor:in) / Ahn, H. S. (Autor:in)
JOURNAL OF FRICTION AND WEAR C/C OF TRENIE I IZNOS ; 38 ; 469-476
01.01.2017
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.89
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