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Hafnium silicon oxide films prepared by atomic layer deposition
Hafnium silicon oxide films prepared by atomic layer deposition
Hafnium silicon oxide films prepared by atomic layer deposition
Kukli, K. (Autor:in) / Ritala, M. (Autor:in) / Leskela, M. (Autor:in) / Sajavaara, T. (Autor:in) / Keinonen, J. (Autor:in) / Gilmer, D. C. (Autor:in) / Tobin, P. J. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 109 ; 2-5
01.01.2004
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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