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Properties of TiAlC Film Prepared by Thermal Atom Layer Depositing Technique
Properties of TiAlC Film Prepared by Thermal Atom Layer Depositing Technique
Properties of TiAlC Film Prepared by Thermal Atom Layer Depositing Technique
Yang, Yong-liang (Autor:in) / Zhang, Hong-yun (Autor:in) / Li, Na (Autor:in)
Cai liao bao hu = ; 50 ; 40-43
01.01.2017
4 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
620.1
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