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Improving the electrical and hysteresis performance of amorphous igzo thin-film transistors using co-sputtered zirconium silicon oxide gate dielectrics
Improving the electrical and hysteresis performance of amorphous igzo thin-film transistors using co-sputtered zirconium silicon oxide gate dielectrics
Improving the electrical and hysteresis performance of amorphous igzo thin-film transistors using co-sputtered zirconium silicon oxide gate dielectrics
Hung, Chien-Hsiung (Autor:in) / Wang, Shui-Jinn (Autor:in) / Liu, Pang-Yi (Autor:in) / Wu, Chien-Hung (Autor:in) / Yan, Hao-Ping (Autor:in) / Wu, Nai-Sheng (Autor:in) / Lin, Tseng-Hsing (Autor:in)
Materials science in semiconductor processing ; 67 ; 84-91
01.01.2017
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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