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Porous nC-Si/SiOx nanostructured layer on Si substrate with tunable photoluminescent properties fabricated by direct, precursor-free microplasma irradiation in air
Porous nC-Si/SiOx nanostructured layer on Si substrate with tunable photoluminescent properties fabricated by direct, precursor-free microplasma irradiation in air
Porous nC-Si/SiOx nanostructured layer on Si substrate with tunable photoluminescent properties fabricated by direct, precursor-free microplasma irradiation in air
Wang, Tao (Autor:in) / Hu, Mingshan (Autor:in) / Yang, Bin (Autor:in) / Wang, Xiaolin (Autor:in) / Liu, Jingquan (Autor:in)
Applied surface science ; 433 ; 988-993
01.01.2018
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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