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    Porous nC-Si/SiOx nanostructured layer on Si substrate with tunable photoluminescent properties fabricated by direct, precursor-free microplasma irradiation in air

    New search for: Wang, Tao
    New search for: Hu, Mingshan
    New search for: Yang, Bin
    New search for: Wang, Xiaolin
    New search for: Liu, Jingquan

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    Porous nC-Si/SiOx nanostructured layer on Si substrate with tunable photoluminescent properties fabricated by direct, precursor-free microplasma irradiation in air

    New search for: Wang, Tao
    New search for: Hu, Mingshan
    New search for: Yang, Bin
    New search for: Wang, Xiaolin
    New search for: Liu, Jingquan

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Porous nC-Si/SiOx nanostructured layer on Si substrate with tunable photoluminescent properties fabricated by direct, precursor-free microplasma irradiation in air

    New search for: Wang, Tao
    New search for: Hu, Mingshan
    New search for: Yang, Bin
    New search for: Wang, Xiaolin
    New search for: Liu, Jingquan

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Porous nC-Si/SiOx nanostructured layer on Si substrate with tunable photoluminescent properties fabricated by direct, precursor-free microplasma irradiation in air

    Contributors:

    Wang, Tao (author) / Hu, Mingshan (author) / Yang, Bin (author) / Wang, Xiaolin (author) / Liu, Jingquan (author)

    Published in:

    Applied surface science ; 433 ; 988-993

    Publication date:

    2018-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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