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Analysis of arrayed nanocapacitor formed on nanorods by flow-rate interruption atomic layer deposition
Analysis of arrayed nanocapacitor formed on nanorods by flow-rate interruption atomic layer deposition
Analysis of arrayed nanocapacitor formed on nanorods by flow-rate interruption atomic layer deposition
Lin, Bo-Cheng (Autor:in) / Ku, Ching-Shun (Autor:in) / Lee, Hsin-Yi (Autor:in) / Chakroborty, Subhendu (Autor:in) / Wu, Albert T. (Autor:in)
Applied surface science ; 426 ; 224-228
01.01.2017
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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