Yttrium oxide film for protecting quartz glass surface from etching by long-term exposure to chlorine trifluoride gas at room temperature

Kawasaki, Ryohei / Umetsu, Yasuhiro / Kurashima, Keisuke et al. | British Library Online Contents | 2018

4H Silicon Carbide Etching Using Chlorine Trifluoride Gas

Habuka, H. / Katsumi, Y. / Miura, Y. et al. | British Library Online Contents | 2009

Off-Orientation Influence on C-Face (0001) 4H-SiC Surface Morphology Produced by Etching Using Chlorine Trifluoride Gas

Fukumoto, Y. / Habuka, H. / Kato, T. | British Library Online Contents | 2014

A study on the reaction between chlorine trifluoride gas and glass-like carbon

Saito, Y. / Nishizawa, T. / Hamaguchi, M. | British Library Online Contents | 2005

Effect of chlorine trifluoride and perchloryl fluoride on construction materials

Grigger, J.C. / Miller, H.C. | Engineering Index Backfile | 1964