Action mechanism of hydrogen gas on deposition of HfC coating using HfCl4-CH4-H2-Ar system

Wang, Y. / Li, Z. / Xiong, X. et al. | British Library Online Contents | 2016

Action mechanism of hydrogen gas on deposition of HfC coating using HfCl4-CH4-H2-Ar system

Wang, Yalei / Li, Zehao / Xiong, Xiang et al. | British Library Online Contents | 2016

Synthesis of bulk nanocrystalline HfB2 from HfCl4–NaBH4–Mg ternary system

Akçamlı, N. / Ağaoğulları, D. / Balcı, z. et al. | British Library Online Contents | 2017

DFT investigation of HfCl4 decomposition on hydroxylated SiO2: first stage of HfO2 atomic layer deposition

Esteve, A. / Djafari Rouhani, M. / Jeloaica, L. et al. | British Library Online Contents | 2003

Density functional study of initial HfCl4 adsorption and decomposition reactions on silicon surfaces with SiON interfacial layer

Ren, J. / Sun, B. / Zhang, D. W. | British Library Online Contents | 2007