Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Porous GaN photoelectrode fabricated by photo-assisted electrochemical etching using ionic liquid as etchant
Porous GaN photoelectrode fabricated by photo-assisted electrochemical etching using ionic liquid as etchant
Porous GaN photoelectrode fabricated by photo-assisted electrochemical etching using ionic liquid as etchant
Zhang, Miao-Rong (Autor:in) / Qin, Shuang-Jiao (Autor:in) / Peng, Hong-Dan (Autor:in) / Pan, Ge-Bo (Autor:in)
MATERIALS LETTERS ; 182 ; 363-366
01.01.2016
4 pages
Aufsatz (Zeitschrift)
Unbekannt
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Etchant wettability in bulk micromachining of Si by metal-assisted chemical etching
British Library Online Contents | 2016
|Etchant wettability in bulk micromachining of Si by metal-assisted chemical etching
British Library Online Contents | 2016
|Etchant wettability in bulk micromachining of Si by metal-assisted chemical etching
British Library Online Contents | 2016
|Effect of different electrolytes on porous GaN using photo-electrochemical etching
British Library Online Contents | 2011
|