Atomistic mechanisms of chemical mechanical polishing of diamond (1 0 0) in aqueous H2O2/pure H2O: Molecular dynamics simulations using reactive force field (ReaxFF): Fid-Bau Portal

Atomistic mechanisms of chemical mechanical polishing of diamond (1 0 0) in aqueous H2O2/pure H2O: Molecular dynamics simulations using reactive force field (ReaxFF)

Guo, Xiaoguang / Yuan, Song / Wang, Xiaoli / Jin, Zhuji / Kang, Renke

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Atomistic mechanisms of chemical mechanical polishing of diamond (1 0 0) in aqueous H2O2/pure H2O: Molecular dynamics simulations using reactive force field (ReaxFF)

Guo, Xiaoguang / Yuan, Song / Wang, Xiaoli / Jin, Zhuji / Kang, Renke

Atomistic mechanisms of chemical mechanical polishing of diamond (1 0 0) in aqueous H2O2/pure H2O: Molecular dynamics simulations using reactive force field (ReaxFF)

Guo, Xiaoguang / Yuan, Song / Wang, Xiaoli / Jin, Zhuji / Kang, Renke

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Bestellung bei Subito €

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Titel:

Atomistic mechanisms of chemical mechanical polishing of diamond (1 0 0) in aqueous H2O2/pure H2O: Molecular dynamics simulations using reactive force field (ReaxFF)

Beteiligte:

Guo, Xiaoguang (Autor:in) / Yuan, Song (Autor:in) / Wang, Xiaoli (Autor:in) / Jin, Zhuji (Autor:in) / Kang, Renke (Autor:in)

Erschienen in:

Computational materials science ; 157 ; 99-106

Erscheinungsdatum:

01.01.2019

Format / Umfang:

8 pages

ISSN:

0927-0256

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Unbekannt

Klassifikation:

DDC: 620.1

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