Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Atomistic mechanisms of Si chemical mechanical polishing in aqueous H2O2: ReaxFF reactive molecular dynamics simulations
Atomistic mechanisms of Si chemical mechanical polishing in aqueous H2O2: ReaxFF reactive molecular dynamics simulations
Atomistic mechanisms of Si chemical mechanical polishing in aqueous H2O2: ReaxFF reactive molecular dynamics simulations
Wen, Jialin (Autor:in) / Ma, Tianbao (Autor:in) / Zhang, Weiwei (Autor:in) / van Duin, Adri C.T. (Autor:in) / Lu, Xinchun (Autor:in)
Computational materials science ; 131 ; 230-238
01.01.2017
9 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
620.1
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2018
|British Library Online Contents | 2018
|British Library Online Contents | 2016
|British Library Online Contents | 2018
|