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Atomic layer deposition and post-growth thermal annealing of ultrathin MoO3 layers on silicon substrates: Formation of surface nanostructures
Atomic layer deposition and post-growth thermal annealing of ultrathin MoO3 layers on silicon substrates: Formation of surface nanostructures
Atomic layer deposition and post-growth thermal annealing of ultrathin MoO3 layers on silicon substrates: Formation of surface nanostructures
Liu, Hongfei (Autor:in) / Yang, Ren Bin (Autor:in) / Yang, Weifeng (Autor:in) / Jin, Yunjiang (Autor:in) / Lee, Coryl J.J. (Autor:in)
Applied surface science ; 439 ; 583-588
01.01.2018
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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