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Atomic layer deposition and post-growth thermal annealing of ultrathin MoO3 layers on silicon substrates: Formation of surface nanostructures
Atomic layer deposition and post-growth thermal annealing of ultrathin MoO3 layers on silicon substrates: Formation of surface nanostructures
Atomic layer deposition and post-growth thermal annealing of ultrathin MoO3 layers on silicon substrates: Formation of surface nanostructures
Liu, Hongfei (author) / Yang, Ren Bin (author) / Yang, Weifeng (author) / Jin, Yunjiang (author) / Lee, Coryl J.J. (author)
Applied surface science ; 439 ; 583-588
2018-01-01
6 pages
Article (Journal)
English
DDC:
620.44
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