Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Interface chemistry and surface morphology evolution study for InAs/Al2O3 stacks upon in situ ultrahigh vacuum annealing
Interface chemistry and surface morphology evolution study for InAs/Al2O3 stacks upon in situ ultrahigh vacuum annealing
Interface chemistry and surface morphology evolution study for InAs/Al2O3 stacks upon in situ ultrahigh vacuum annealing
Wang, Xinglu (Autor:in) / Qin, Xiaoye (Autor:in) / Wang, Wen (Autor:in) / Liu, Yue (Autor:in) / Shi, Xiaoran (Autor:in) / Sun, Yong (Autor:in) / Liu, Chen (Autor:in) / Zhao, Jiali (Autor:in) / Zhang, Guanhua (Autor:in) / Liu, Hui (Autor:in)
Applied surface science ; 443 ; 567-574
01.01.2018
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2017
|Etch Characteristics and Morphology of Al2O3/TiO2 Stacks for Silicon Surface Passivation
DOAJ | 2019
|Electron-induced surface chemistry on TiN in ultrahigh vacuum
British Library Online Contents | 2002
|Hydrogen induced interface passivation in atomic layer deposited Al2O3 films and Al2O3/SiO2 stacks
British Library Online Contents | 2018
|Hydrogen induced interface passivation in atomic layer deposited Al2O3 films and Al2O3/SiO2 stacks
British Library Online Contents | 2018
|