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Measuring (Oblique) Wave Run-Up and Overtopping with Laser Scanners
Measuring (Oblique) Wave Run-Up and Overtopping with Laser Scanners
Measuring (Oblique) Wave Run-Up and Overtopping with Laser Scanners
Oosterlo, Patrick (Autor:in) / Hofland, Bas (Autor:in) / Van der Meer, Jentsje W. (Autor:in) / Overduin, Maarten (Autor:in) / Steendam, Gosse Jan (Autor:in) / Nieuwenhuis, Jan-Willem (Autor:in) / van Vledder, Gerbrant (Autor:in) / Steetzel, Henk (Autor:in) / Reneerkens, Michiel (Autor:in)
01.01.2019
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
Measuring (Oblique) Wave Run-Up and Overtopping with Laser Scanners
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