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Measuring (Oblique) Wave Run-Up and Overtopping with Laser Scanners
Measuring (Oblique) Wave Run-Up and Overtopping with Laser Scanners
Measuring (Oblique) Wave Run-Up and Overtopping with Laser Scanners
Oosterlo, Patrick (author) / Hofland, Bas (author) / Van der Meer, Jentsje W. (author) / Overduin, Maarten (author) / Steendam, Gosse Jan (author) / Nieuwenhuis, Jan-Willem (author) / van Vledder, Gerbrant (author) / Steetzel, Henk (author) / Reneerkens, Michiel (author)
2019-01-01
Conference paper
Electronic Resource
English
Measuring (Oblique) Wave Run-Up and Overtopping with Laser Scanners
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