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Effect of helium presence on tungsten-deuterium co-deposited films
Co-deposited W-D, W-He, and mixed W-D-He films 250 nm thick were investigated. The films were obtained by magnetron sputtering of W in Ar:D2:He =: 1:1:0, 1:0:1, 1:1:0.05, and 1:1:0.2, gas mixtures and at deposition temperatures of ∼ 350 K, 500 K, and 800 K. The films were studied by thermal desorption spectroscopy (TDS) with Tmax = 2200 K using threshold ionization mass spectrometry to separate D2 and He signals. It was found that films obtained in gas mixtures with mixed He-D2 atmospheres contained less total gas atoms than films deposited in pure D2 or He atmospheres. It was found that in mixed W-D-He films, He trapping with high binding energies (Tdes > 1500 K) is strongly mitigated.
Effect of helium presence on tungsten-deuterium co-deposited films
Co-deposited W-D, W-He, and mixed W-D-He films 250 nm thick were investigated. The films were obtained by magnetron sputtering of W in Ar:D2:He =: 1:1:0, 1:0:1, 1:1:0.05, and 1:1:0.2, gas mixtures and at deposition temperatures of ∼ 350 K, 500 K, and 800 K. The films were studied by thermal desorption spectroscopy (TDS) with Tmax = 2200 K using threshold ionization mass spectrometry to separate D2 and He signals. It was found that films obtained in gas mixtures with mixed He-D2 atmospheres contained less total gas atoms than films deposited in pure D2 or He atmospheres. It was found that in mixed W-D-He films, He trapping with high binding energies (Tdes > 1500 K) is strongly mitigated.
Effect of helium presence on tungsten-deuterium co-deposited films
S. Krat (Autor:in) / E. Fefelova (Autor:in) / A. Pryshvitsin (Autor:in) / Yu. Gasparyan (Autor:in) / I. Sorokin (Autor:in) / V. Efimov (Autor:in) / A. Pisarev (Autor:in)
2023
Aufsatz (Zeitschrift)
Elektronische Ressource
Unbekannt
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