Structural analysis of silicon oxynitride films deposited by PECVD

Criado, D. / Alayo, M. I. / Pereyra, I. et al. | British Library Online Contents | 2004

Characterization of silicon oxynitride thin films deposited by electron beam physical vapor deposition technique

Mohite, K. C. / Khollam, Y. B. / Mandale, A. B. et al. | British Library Online Contents | 2003

Plasma enhanced growth, composition and refractive index of silicon oxynitride films

Bose, M. / Bose, D. N. / Basa, D. K. | British Library Online Contents | 2002

Effect of film chemistry on refractive index of plasma-enhanced chemical vapor deposited silicon oxynitride films: A correlative study

Naskar, S. / Wolter, S.D. / Bower, C.A. et al. | British Library Online Contents | 2008

Deuterium retention in deposited W layer exposed to EAST deuterium plasma

K. Katayama / N. Ashikawa / F. Ding et al. | DOAJ | 2017