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Oxide sintered body, oxide sputtering target and conductive oxide thin film with high refractive index, and method for producing oxide sintered body

NARA ATSUSHI

A sintered body which is composed of indium (In), titanium (Ti) or chromium (Cr), zinc (Zn) or tin (Sn), and oxygen (O), which comprises 2 to 65 mol% of In as In2O3 and 2 to 65 mol% of Ti or Cr as TiO2 or Cr2O3 respectively, and which when an atom ratio of In is A (at%), atom ratio of Ti or Cr is B (at%), and atom ratio of Zn or Sn is C (at%), satisfies 0.5<=A/B<=5 and 0<10. A transparent thin film with a high refractive index can be formed which has a low bulk resistance and is capable of DC sputtering.

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Oxide sintered body, oxide sputtering target and conductive oxide thin film with high refractive index, and method for producing oxide sintered body

NARA ATSUSHI

A sintered body which is composed of indium (In), titanium (Ti) or chromium (Cr), zinc (Zn) or tin (Sn), and oxygen (O), which comprises 2 to 65 mol% of In as In2O3 and 2 to 65 mol% of Ti or Cr as TiO2 or Cr2O3 respectively, and which when an atom ratio of In is A (at%), atom ratio of Ti or Cr is B (at%), and atom ratio of Zn or Sn is C (at%), satisfies 0.5<=A/B<=5 and 0<10. A transparent thin film with a high refractive index can be formed which has a low bulk resistance and is capable of DC sputtering.

Oxide sintered body, oxide sputtering target and conductive oxide thin film with high refractive index, and method for producing oxide sintered body

NARA ATSUSHI

A sintered body which is composed of indium (In), titanium (Ti) or chromium (Cr), zinc (Zn) or tin (Sn), and oxygen (O), which comprises 2 to 65 mol% of In as In2O3 and 2 to 65 mol% of Ti or Cr as TiO2 or Cr2O3 respectively, and which when an atom ratio of In is A (at%), atom ratio of Ti or Cr is B (at%), and atom ratio of Zn or Sn is C (at%), satisfies 0.5<=A/B<=5 and 0<10. A transparent thin film with a high refractive index can be formed which has a low bulk resistance and is capable of DC sputtering.

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Titel:

Oxide sintered body, oxide sputtering target and conductive oxide thin film with high refractive index, and method for producing oxide sintered body

Beteiligte:

NARA ATSUSHI (Autor:in)

Erscheinungsdatum:

24.06.2015

Medientyp:

Patent

Format:

Elektronische Ressource

Sprache:

Englisch

Klassifikation:

IPC: C04B Kalk , LIME / C23C Beschichten metallischer Werkstoffe , COATING METALLIC MATERIAL / H01B CABLES , Kabel

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