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Carbon nano tube transparent conducting thin film patterning method
The invention discloses a carbon nano tube transparent conducting thin film patterning method. The carbon nano tube transparent conducting thin film patterning method comprises the following steps: providing a transparent conducting thin film comprising a substrate and a transparent conducting layer mainly composed of a carbon nano tube; covering up the conducting layer with a mask of a hollowed-out graph structure; putting the transparent conducting thin film into an etching chamber, then introducing a working gas, generating any plasma which can react with the carbon nano tube to generate a gaseous product but does not damage the substrate and the mask, completely removing a local part, exposed by the hollowed-out graph structure of the mask, of the transparent conducting layer by utilizing the plasma, and reserving the other region, not covered by the mask, of the transparent conducting layer, thereby finally obtaining the target product. The carbon nano tube transparent conducting thin film patterning method has the advantages that the technology is simple, the cost is low, the efficiency is high, batched carbon nano tube transparent conducting thin film patterning treatment can be completed in one step, the yield is high, and the obtained transparent conducting thin film has excellent and stable optical and electrical properties and can be widely applied to all kinds of optical and electrical equipment.
Carbon nano tube transparent conducting thin film patterning method
The invention discloses a carbon nano tube transparent conducting thin film patterning method. The carbon nano tube transparent conducting thin film patterning method comprises the following steps: providing a transparent conducting thin film comprising a substrate and a transparent conducting layer mainly composed of a carbon nano tube; covering up the conducting layer with a mask of a hollowed-out graph structure; putting the transparent conducting thin film into an etching chamber, then introducing a working gas, generating any plasma which can react with the carbon nano tube to generate a gaseous product but does not damage the substrate and the mask, completely removing a local part, exposed by the hollowed-out graph structure of the mask, of the transparent conducting layer by utilizing the plasma, and reserving the other region, not covered by the mask, of the transparent conducting layer, thereby finally obtaining the target product. The carbon nano tube transparent conducting thin film patterning method has the advantages that the technology is simple, the cost is low, the efficiency is high, batched carbon nano tube transparent conducting thin film patterning treatment can be completed in one step, the yield is high, and the obtained transparent conducting thin film has excellent and stable optical and electrical properties and can be widely applied to all kinds of optical and electrical equipment.
Carbon nano tube transparent conducting thin film patterning method
CHEN XINJIANG (Autor:in)
30.09.2015
Patent
Elektronische Ressource
Englisch
IPC:
C04B
Kalk
,
LIME
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